In situ oxygen plasma cleaning of a PECVD source for hard disk overcoats

Applied Physics A: Materials Science and Processing

Volumn 78, Issue 5, 2004, Pages 637-639

  Ochs, D ^a,c   Cord, B ^b  

^a Fresenius Kabi Deutschland GmbH   (Germany)

^b Singulus AG   (Germany)

^c Unaxis   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; ELECTRODES; IONIZATION; OXYGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS; RECORDING;

ACETYLENE FLOW; DIAMOND-LIKE CARBON PROTECTIVE OVERCOAT; HARD DISK OVERCOATS; PLASMA CLEANING;

HARD DISK STORAGE;

EID: 18844384898     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00339-003-2271-9     Document Type: Article

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