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Volumn 24, Issue 15, 2008, Pages 7947-7954

Investigation of a vapor-deposited thin silica film: Morphological and spectral characterization

Author keywords

[No Author keywords available]

Indexed keywords

APPLICATIONS.; CONTACT ANGLES; CONVENTIONAL PROCESSING; FOURIER TRANSFORM INFRARED; HYDROXYL GROUPS; ISOTOPIC EXCHANGES; NEW MATERIALS; ORGANO SILICON COMPOUNDS; ORGANOSILANE; OXIDE LAYERS; POLY-METHYL METHACRYLATE; POLYMERS AND PLASTICS; PROCESSING PARAMETERS; ROOM TEMPERATURES; SILANOL GROUPS; SILICA FILMS; SILICA LAYERS; SILICA MATERIALS; SPECTRAL CHARACTERIZATION; SPECTRAL DATA; SURFACE MODIFICATIONS; TETRACHLOROSILANE; THIN SILICA FILM; VAPOR-PHASE; VIBRATING SURFACES;

EID: 49649090670     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la800591n     Document Type: Article
Times cited : (10)

References (32)
  • 3
    • 49649122130 scopus 로고    scopus 로고
    • Ph.D. thesis, University of California at Berkeley
    • Ashurst, W. R. Ph.D. thesis, University of California at Berkeley, 2003.
    • (2003)
    • Ashurst, W.R.1
  • 13
    • 49649109748 scopus 로고    scopus 로고
    • Sandia National Labs
    • Technical report SAND2000-3016, Albuquerque, NM US
    • Follstaedt, S. C.; Last, J. A.; Cheung, D. K.; Gourley, P. L.; Sasaki, D. Y. Technical report SAND2000-3016, Sandia National Labs., Albuquerque, NM (US); 2000.
    • (2000)
    • Follstaedt, S.C.1    Last, J.A.2    Cheung, D.K.3    Gourley, P.L.4    Sasaki, D.Y.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.