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Volumn 24, Issue 15, 2008, Pages 7947-7954
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Investigation of a vapor-deposited thin silica film: Morphological and spectral characterization
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Author keywords
[No Author keywords available]
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Indexed keywords
APPLICATIONS.;
CONTACT ANGLES;
CONVENTIONAL PROCESSING;
FOURIER TRANSFORM INFRARED;
HYDROXYL GROUPS;
ISOTOPIC EXCHANGES;
NEW MATERIALS;
ORGANO SILICON COMPOUNDS;
ORGANOSILANE;
OXIDE LAYERS;
POLY-METHYL METHACRYLATE;
POLYMERS AND PLASTICS;
PROCESSING PARAMETERS;
ROOM TEMPERATURES;
SILANOL GROUPS;
SILICA FILMS;
SILICA LAYERS;
SILICA MATERIALS;
SPECTRAL CHARACTERIZATION;
SPECTRAL DATA;
SURFACE MODIFICATIONS;
TETRACHLOROSILANE;
THIN SILICA FILM;
VAPOR-PHASE;
VIBRATING SURFACES;
ARSENIC COMPOUNDS;
ATOMIC FORCE MICROSCOPY;
ATOMIC SPECTROSCOPY;
CHLORINE COMPOUNDS;
COMPLEXATION;
CONTACT ANGLE;
DEWATERING;
ELASTOMERS;
ELECTRON BEAM LITHOGRAPHY;
ESTERS;
FILMS;
FOURIER TRANSFORM INFRARED SPECTROSCOPY;
FOURIER TRANSFORMS;
HYDROGEN;
IMAGING TECHNIQUES;
INFRARED SPECTROSCOPY;
ISOTOPES;
MICROSCOPIC EXAMINATION;
NONMETALS;
PHOTORESISTS;
PLASTIC PRODUCTS;
PLASTICITY;
POLYMER BLENDS;
POLYMERS;
POLYSTYRENES;
SCANNING PROBE MICROSCOPY;
SILANES;
SILICA;
SILICATE MINERALS;
SILICON COMPOUNDS;
SPECTROSCOPIC ANALYSIS;
SPECTRUM ANALYZERS;
SURFACE TREATMENT;
SURFACES;
VAPORS;
WEIGHT CONTROL;
SURFACE REACTIONS;
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EID: 49649090670
PISSN: 07437463
EISSN: None
Source Type: Journal
DOI: 10.1021/la800591n Document Type: Article |
Times cited : (10)
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References (32)
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