Preparation and characterization of thin films of SiOx on gold substrates for surface plasmon resonance studies

Langmuir

Volumn 22, Issue 4, 2006, Pages 1660-1663

  Szunerits, Sabine ^a   Boukherroub, Rabah ^b,c  

^a GRENOBLE INSTITUTE OF TECHNOLOGY   (France)

^b CNRS   (France)

^c INSTITUT D ELECTRONIQUE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; AMORPHOUS MATERIALS; GOLD; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON COMPOUNDS; SURFACE ROUGHNESS;

AMORPHOUS SILICA; SILANOL SURFACE GROUPS; SILICA FILMS;

THIN FILMS;

EID: 33644503595     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la052773c     Document Type: Article

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