Formation of PZT crack-free thick films by electrohydrodynamic atomization deposition

Journal of the European Ceramic Society

Volumn 28, Issue 14, 2008, Pages 2739-2745

  Wang, D ^a   Edirisinghe, M J ^b   Dorey, R A ^a  

^a CRANFIELD UNIVERSITY   (United Kingdom)

^b UNIVERSITY COLLEGE LONDON   (United Kingdom)

Author keywords

Electrohydrodynamic atomization; Films; PZT; Suspensions

Indexed keywords

ATOMIZATION; COLLOIDS; DEPOSITS; ELECTROHYDRODYNAMICS; FLUID DYNAMICS; FLUID MECHANICS; GELATION; HYDRAULICS; HYDRODYNAMICS; JETS; LEAD; LITHOGRAPHY; MICROELECTRONICS; PIEZOELECTRIC ACTUATORS; PIEZOELECTRIC MATERIALS; PIEZOELECTRIC TRANSDUCERS; SEMICONDUCTING LEAD COMPOUNDS; SPRAYING; THICK FILMS; VAPOR DEPOSITION;

COMPOSITE SOL; CRACK FREE; CRACK FREE FILMS; DENSE FILMS; ELECTROHYDRODYNAMIC ATOMIZATION (EHDA); JET BREAK UP; LEAD ZIRCONATE TITANATE (PZTN); OPTIMUM DEPOSITION; POROUS FILMS; RELATIVE PERMITTIVITY (RP); SUBSTRATE DISTANCE;

COMPOSITE FILMS;

EID: 48449099525     PISSN: 09552219     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jeurceramsoc.2008.04.013     Document Type: Article

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