Correlation between self-diffusion in Si and the migration mechanisms of vacancies and self-interstitials: An atomistic study

Physical Review B - Condensed Matter and Materials Physics

Volumn 78, Issue 3, 2008, Pages

  Posselt, M ^a   Gao, F ^b   Bracht, H ^c  

^a INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

^b PACIFIC NORTHWEST NATIONAL LABORATORY   (United States)

^c UNIVERSITY OF MÜNSTER   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 48449088749     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.78.035208     Document Type: Article

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