Aiming for the best matching between ultra-shallow doping and milli- To femto-second activation

15th IEEE International Conference on Advanced Thermal Processing of Semiconductors, RTP 2007

Volumn , Issue , 2007, Pages 1-10

  Mizuno, Bunji ^a   Sasaki, Yuichiro ^a  

^a Ultimate Junction Technologies Inc 570 8501   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALS; ELECTRIC CONDUCTIVITY; INTERNET PROTOCOLS; RAPID THERMAL PROCESSING; SEMICONDUCTOR MATERIALS;

3D STRUCTURES; BEST MATCHING; ELECTRIC DEVICES; PLANAR TRANSISTORS; PLASMA DOPING; SEMI-CONDUCTORS;

RAPID THERMAL ANNEALING;

EID: 47949093551     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/RTP.2007.4383811     Document Type: Conference Paper

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