Dual-domain scanning illuminator for the SEMATECH Berkeley microfield exposure tool

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 25, Issue 6, 2007, Pages 2151-2154

  Anderson, Christopher N ^a   Naulleau, Patrick P ^b   Denham, Paul ^b   Kemp, Drew ^b   Rekawa, Senajith ^b  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ILLUMINATORS; INTENSITY VARIATION; SEMATECH BERKELEY;

EXTREME ULTRAVIOLET LITHOGRAPHY; FOURIER ANALYSIS; SCANNING ELECTRON MICROSCOPY; SYNCHROTRONS; WAFER BONDING;

LIGHTING;

EID: 37149049909     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2804610     Document Type: Article

References (6)

1. P. Naulleau, K. A. Goldberg, P. Batson, J. Bokor, P. Denham, and S. Rekawa, Appl. Opt. 43, 820 (2003).
2. C. Kopp, L. Ravel, and P. Meyrueis, J. Opt. A, Pure Appl. Opt. 1, 398 (1999).
3. C. Chang, P. Naulleau, E. Anderson, and D. Attwood, Opt. Commun. 182, 24 (2000).
4. NU-TEK Precision Optical Corp., 1202 Technology Dr., Aberdeen, MD 21001.
5. F. Salmassi, P. Naulleau, and E. Gullikson, Appl. Opt. 45, 2404 (2005).
6. Nutfield Technology, Inc., 49 Range Road, Windham, NH 03087-2019.