Photoluminescence from intermediate phase silicon structure and nanocrystalline silicon in plasma enhanced chemical vapor deposition grown Si/SiO2 multilayers

Nanotechnology

Volumn 19, Issue 32, 2008, Pages

  Han, P G ^a   Ma, Z Y ^b   Wang, Z B ^a   Zhang, X ^a  

^a QUFU NORMAL UNIVERSITY   (China)

^b NANJING UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

METALLIZING; NANOCRYSTALLINE SILICON; NONMETALS; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON;

CHEMICAL VAPORS; INTERMEDIATE PHASE SILICON STRUCTURE (IPSS); NANO CRYSTALLINE;

VAPOR DEPOSITION;

NANOCRYSTAL; NANOMATERIAL; SILICATE; SILICON;

ARTICLE; CRYSTALLIZATION; OXIDATION; PHOTOLUMINESCENCE; PRIORITY JOURNAL; RAMAN SPECTROMETRY; TEMPERATURE MEASUREMENT; TRANSMISSION ELECTRON MICROSCOPY; VAPOR;

EID: 47249137705     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/19/32/325708     Document Type: Article

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