Optical properties of nanocrystalline silicon films deposited by plasma-enhanced chemical vapor deposition

Optical Materials

Volumn 30, Issue 2, 2007, Pages 238-243

  Ali, Atif Mossad ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

Deposition temperature; Effect of hydrogen addition; Nanocrystalline silicon; PECVD; Photoluminescence; Quantum size effect

Indexed keywords

GAS MIXTURES; NANOCRYSTALLINE SILICON; NANOCRYSTALS; OPTICAL BAND GAPS; OPTICAL PROPERTIES; PHOTOLUMINESCENCE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

DEPOSITION TEMPERATURE; HYDROGEN FLOW RATE; QUANTUM-SIZE EFFECT;

THIN FILMS;

EID: 34548516175     PISSN: 09253467     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.optmat.2006.11.042     Document Type: Article

References (21)

1. Kim J.H., Jeon K.A., Kim G.H., and Lee S.Y. Opt. Mater. 27 (2005) 991
2. Veprek S., Wirschem T., Ruckschloß M., Tamura H., and Oswald J. Mater. Res. Soc. Symp. Proc. 358 (1995) 99
3. Cicala G., Bruno G., Capezzuto P., Schiavulli L., Capozzi V., and Perna G. Mater. Res. Soc. Symp. Proc. 452 (1997) 809
4. Edelberg E., Bergh S., Naone R., Hall M., and Aydil E.S. J. Appl. Phys. 81 (1997) 2410
5. Milovzorov D., Inokuma T., Kurata Y., and Hasegawa S. J. Electrochem. Soc. 145 (1998) 3615
6. Kim S.K., Park K.C., and Jang J. J. Appl. Phys. 77 (1995) 5115
7. Lim H.J., Ryu B.Y., Ryu J.I., and Jang J. Thin Solid Films 289 (1996) 227
8. Solomon I., Drevillon B., Shirai H., and Layadi N. J. Non-Cryst. Solids 164-166 (1993) 98
9. Oda S., and Odobe M. Mater. Res. Soc. Symp. Proc. 358 (1995) 721
10. Cullity B.D. Elements of X-Ray Difffraction (1978), Addison-Wesley, Reading p. 102
11. Iverson R.B., and Reif R. J. Appl. Phys. 62 (1987) 1675
12. Tsu D.V., Lucovsky G., and Davidson B.N. Phys. Rev. B 40 (1989) 1795
13. Ali A.M., Inokuma T., Kurata Y., and Hasegawa S. Jpn. J. Appl. Phys. 38 (1999) 6047
14. Zhao X., Schoenfeld O., Aoyagi Y., and Sugano T. Appl. Phys. Lett. 65 (1994) 1290
15. Ali A.M., Inokuma T., Kurata Y., and Hasegawa S. Mater. Sci. Eng. C 15 (2001) 125
16. Kenyon A.J., Trwoga P.F., and Pitt C.W. J. Appl. Phys. 79 (1996) 9291
17. Zhao X., Schoenfeld O., Kusano J., Aoyagi Y., and Sugano T. Jpn. J. Appl. Phys. 33 (1994) L649
18. Stevens Kalceff M.A., and Phillips M.R. Phys. Rev. B 52 (1995) 3122
19. Efros Al.L., and Efros A.L. Sov. Phys. Semicond. 16 (1982) 772
20. Kayanuma Y. Phys. Rev. B 38 (1988) 9797
21. Furukawa S., and Miyasato T. Phys. Rev. B 38 (1988) 5726