The effect of thermal annealing on crystallization in a-Si:H/SiO 2 multilayers by using layer by layer plasma oxidation

Journal of Physics Condensed Matter

Volumn 15, Issue 34, 2003, Pages 5793-5799

  Sui, Yanping ^a   Huang, Xinfan ^a   Ma, Zhongyuan ^a   Li, Wei ^a   Qiao, Feng ^a   Chen, Kai ^a   Chen, Kunji ^a  

^a NANJING UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLIZATION; GRAIN SIZE AND SHAPE; OXIDATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAPID THERMAL ANNEALING;

PLASMA OXIDATION;

MULTILAYERS;

EID: 0141830854     PISSN: 09538984     EISSN: None     Source Type: Journal    
DOI: 10.1088/0953-8984/15/34/309     Document Type: Conference Paper

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