The effect of annealing conditions on the red photoluminescence of nanocrystalline Si/SiO2 films

Thin Solid Films

Volumn 425, Issue 1-2, 2003, Pages 175-184

  Wu, Xiaochun ^a   Bek, Alpan ^a   Bittner, Alexander M ^a   Eggs, Ch ^b   Ossadnik, Ch ^b   Veprek, S ^b  

^a MAX PLANCK INSTITUT FÜR FESTKÖRPERFORSCHUNG   (Germany)

^b TECHNICAL UNIVERSITY OF MUNICH   (Germany)

Author keywords

Annealing conditions; Photoluminescence; Thermal donors

Indexed keywords

ANNEALING; CHEMICAL VAPOR DEPOSITION; KINETIC THEORY; NANOSTRUCTURED MATERIALS; OSCILLATIONS; PHOTOLUMINESCENCE; SILICA; THERMAL EFFECTS;

THERMAL DONORS;

SEMICONDUCTING FILMS;

EID: 0037415949     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)01113-6     Document Type: Article

References (39)

1. Canham L.T. Appl. Phys. Lett. 57:1990;1046.
2. Kanemitsu Y. Phys. Rep. 263:1995;1.
3. Cullis A.G., Canham L.T., Calcott P.D.J. J. Appl. Phys. 82:1997;909.
4. Cullis A.G., Canham L.T. Nature. 353:1991;335.
5. Koch F., Petrova-Koch V., Muschik T., Nikolov A., Gavrilenko V. Mater. Res. Soc. Symp. Proc. 283:1992;197.
6. Brant S.M., Fuchs D.H., Stutzmann M., Weber J., Cardona M. Solid State Comm. 81:1992;307.
7. Prokes M.S., Glembocki J.U., Bermudez U.M., Kaplan R., Friedersdorf E.L., Searon C.P. Phys. Rev. B. 45:1992;13788.
8. Tsai C., Li H.K., Kinosky S.D., Qian Z.R., Hsu C.T., Irby T.J., Banerjee S.K., Hance K.B., White M. J. Appl. Phys. Lett. 60:1992;1700.
9. Veprek S., Ruckschloss M., Landkammer B., Ambacher O. Mat. Res. Soc. Symp. Proc. 298:1993;117.
10. Proke M.S. Appl. Phys. Lett. 62:1993;3244.
11. Gole J.L., Dixon D.A. J. Phys. Chem. B. 101:1997;8098.
12. Gole J.L., Dudel F.P., Grantier D., Dixon D.A. Phys. Rev. B. 56:1997;2137.
13. Gole J.L., Dixon D.A. J. Phys. Chem. B. 102:1998;1768.
14. Kanemitsu Y., Ogawa T., Shiraishi K., Takeda K. Phys. Rev. B. 48:1993;4883.
15. Wadayama T., Arigane T., Hatta A. Appl. Phys. Lett. 73:1998;2570.
16. Cooke D.W., Bennett B.L., Farnum E.H., Hults W.L., Sickafus K.E., Smith J.F., Smith J.L., Taylor T.N., Tiwari P., Portis A.M. Appl. Phys. Lett. 68:1996;1663.
17. Andersen K.O., Veje E. Phys. Rev. B. 53:1996;15643.
18. Wolkin M.V., Jorne J., Fauchet P.M., Allan G., Delerue C. Phys. Rev. Lett. 82:1999;197.
19. Takagi H., Ogawa H., Yamazaki Y., Ishizaki A., Nakagiri T. Appl. Phys. Lett. 24:1990;2379.
20. Ito T., Ohta T., Hiraki A. Jpn J. Appl. Phys. 31:1992;L1.
21. Brongersma M.L., Polman A., Min K.S., Boer E., Tambo T., Atwater H.A. Appl. Phys. Lett. 72:1998;2577.
22. Veprek S., Wirschem Th. Hummel R.E., Wissmann P. Handbook of Optical Properties, vol. 2. 1997;129 CRC Press, Boca Raton.
23. Prokes S.M., Carlos W.E., Veprek S., Ossadnik Ch. Phys. Rev. B. 58:1998;15632.
24. Wu X.C., Ossadnik Ch., Eggs Ch., Veprek S., Phillip F. J. Vas. Sci. Technol. B. 20:2002;1368.
25. Shin S., Jung K.H., Yan J., Kwong D.L., Kovar M., White J.M. Appl. Phys. Lett. 63:1993;3306.
26. Czaputa P., Fritzl R., Popitsch A. Thin Solid Films. 255:1995;212.
27. Collins R.T., Tischler M.A., Stathis J.H. Appl. Phys. Lett. 61:1992;1649.
28. Tsybeskov L., Fauchet P.M. Appl. Phys. Lett. 64:1994;1983.
29. Cooke D.W., Bennett B.L., Farnum E.H., Hults W.L., Sickafus K.E., Smith J.F., Smith J.L., Taylor T.N., Tiwari P., Portis A.M. Appl. Phys. Lett. 68:1996;1663.
30. Gregorkiewicz T., Bekman H.H.P.Th., Ammerlaan C.A.J. Phys. Rev. B. 41:1990;12628.
31. Goetz W., Pensl G. Phys. Rev. B. 46:1992;4312.
32. Deak P., Snyder L.C., Corbett J.W. Phys. Rev. B. 45:1992;11612.
33. Ammerlaan C.A.J., Zevenbergen I.S., Martynov Yu.V., Gregorkiewicz T. Jones R. Early Stages of Oxygen Precipitation in Silicon. 1996;61 Kluwer Academic Publishers, Dordrecht.
34. Gregorkiewicz T., van Wezep D.A., Bekman H.H.P.Th., Ammerlaan C.A.J. Phys. Rev. B. 35:1987;3810.
35. Michel J., Kimerling L.C. Shimura F. Oxygen in Silicon. 1994;251 Academic Press, San Diego, CA.
36. Gray P., Scott S.K. Chemical Oscillations and Instabilities. 1990;Clarendon Press, Oxford.
37. Coulthard I., Antel W.J., Freeland J.W. Jr., Sham T.K., Naftel S.J., Zhang P. Appl. Phys. Lett. 77:2000;498.
38. Wang J.P., Song L., Zou B.S., El-Sayed M.A. Phys. Rev. B. 59:1999;5026.
39. Porteanu H.E., Lifshitz E., Dittrich Th., Petrova-Koch V. Phys. Rev. B. 60:1999;15538.