Resistive switching in organic memories with a spin-coated metal oxide nanoparticle layer

Journal of Physical Chemistry C

Volumn 112, Issue 14, 2008, Pages 5254-5257

  Verbakel, Frank ^a,b   Meskers, Stefan C J ^a,b   De Leeuw, Dago M ^c   Janssen, René A J ^a,b  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b DUTCH POLYMER INSTITUTE DPI   (Netherlands)

^c PHILIPS RESEARCH LABORATORIES   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

METALLIC COMPOUNDS; METALS; NANOPARTICLES; NANOSTRUCTURES; SPIN DYNAMICS; SWITCHING SYSTEMS;

COATED LAYERS; METAL OXIDES; ORGANIC MEMORIES; RESISTIVE SWITCHING;

NANOSTRUCTURED MATERIALS;

EID: 47149085276     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp800624u     Document Type: Article

References (25)

1. Scott, J. C.; Bozano, L. D. Adv. Mater. 2007, 19, 1452.
2. Yang, Y.; Ouyang, J.; Ma, L.; Tseng, R. J.-H.; Chu, C.-W. Adv. Func. Mater. 2006, 16, 1001.
3. Bozano, L. D.; Kean, B. W.; Beinhoff, M.; Carter, K. R.; Rice, P. M.; Scott, J. C. Adv. Func. Mater. 2005, 15, 1933.
4. Tang, W.; Shi, H. Z.; Xu, G.; Ong, B. S.; Popovic, Z. D.; Deng, J. C.; Zhao, J.; Rao, G. H. Adv. Mater. 2005, 17, 2307.
5. Cölle, M.; Büchel, M.; de Leeuw, D. M. Org. Electron. 2006, 7, 305.
6. Verbakel, F.; Meskers, S. C. J.; Cölle, M.; Büchel, M.; Gomes, H. L.; Janssen, R. A. J.; de Leeuw, D. M. Appl. Phys. Lett. 2007, 91, 192103.
7. Gomes, H. L.; Benvenho, A. R.; de Leeuw, D. M.; Cölle, M.; Stallinga, P.; Verbakel, F.; Taylor, D. M. Org. Electon. 2008, 9, 119.
8. Hickmott, T. W. J. Appl. Phys. 2000, 88, 2805.
9. Pacholski, C.; Kornowski, A.; Weller, H. Angew. Chem., Int. Ed. 2002, 41, 1188.
10. Verbakel, F.; Meskers, S. C. J.; van den Biggelaar, A. J. M.; Gomes, H. L.; Janssen, R. A. J.; de Leeuw, D. M. Submitted for publication to Org. Electron.
11. Simmons, J. G.; Verderber, R. R. Proc. R. Soc. Lond., Ser. A 1967, 301, 77.
12. Bozano, L. D.; Kean, B. W.; Deline, V. R.; Salem, J. R.; Scott, J. C. Appl. Phys. Lett. 2004, 84, 607.
13. Verbakel, F.; Meskers, S. C. J.; Janssen, R. A. J. J. Appl. Phys. 2007, 102, 083701.
14. Verbakel, F.; Meskers, S. C. J.; Janssen, R. A. J. Appl. Phys Lett. 2006, 89, 102103.
15. See Supporting Information.
16. Hickmott, T. W. J. Appl. Phys. 2000, 88, 2805.
17. Argall, F. Solid-State Electron. 1968, 11, 535.
18. Tsunoda, K.; Fukuzumi, Y.; Jameson, J. R.; Wang, Z.; Griffin, P. B.; Nishi, Y. Appl. Phys. Lett. 2007, 90, 113501.
19. Choi, B. J.; Choi, S.; Kim, K. M.; Shin, Y. C.; Hwanga, C. S.; Hwang, S.-Y.; Cho, S.; Park, S.; Hong, S.-K. Appl. Phys. Lett. 2006, 89, 012906.
20. Hada, T.; Wasa, K.; Hayakawa, S Jpn. J. Appl. Phys. 1971, 10, 521.
21. Park, K. C.; Basavaiah, S.; J. Non-Cryst. Solids 1970, 2, 284.
22. Fors, R.; Khartsev, S. I.; Grishin, A. M. Phys. Rev. B 2005, 71, 045305.
23. Pergament, A. L.; Malinenko, V. P.; Tulubaeva, O. I.; Aleshina, L. A. Phys. Status Solidi A 2004, 201, 1543.
24. Waser, R.; Aono, M. Nat. Mater. 2007, 6, 833.
25. Yoshida, C.; Tsunoda, K.; Noshiro, H.; Sugiyama, Y. Appl. Phys. Lett. 2007, 91, 223510.