Effect of HAc and IPA addition in ozonated water cleaning system for ArF photoresist removal

Journal of the Electrochemical Society

Volumn 155, Issue 8, 2008, Pages

  Lee, Jonghyuck ^a   Park, Kibyung ^a   Lim, Sangwoo ^a  

^a Yonsei University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ACETIC ACID; ADDITION REACTIONS; AIR POLLUTION; FATTY ACIDS; GASES; OZONE; OZONE LAYER; PHOTOACOUSTIC EFFECT; PHOTORESISTORS; PHOTORESISTS; RATE CONSTANTS; SURFACE TREATMENT; VAPORS;

CONCENTRATION (COMPOSITION); DIRECT OXIDATION; ELECTROCHEMICAL SOCIETY (ECS); FORMATION RATES; HIGH SPEEDS; HYDROXYL RADICAL (OH); ISO-PROPYL ALCOHOL (IPA); OZONATED WATER; OZONE CONCENTRATIONS; PHOTORESIST REMOVAL; SIMULATION RESULTS; WATER MIXTURES;

WATER VAPOR;

EID: 46649105121     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2946428     Document Type: Article

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