Transmission electron microscopy studies and simulation of the indentation response of superelastic fullerenelike carbon nitride thin films

Journal of Applied Physics

Volumn 103, Issue 12, 2008, Pages

  Neidhardt, J ^a   Walter, C ^a   Molina Aldareguia, J M ^b   Herrmann, M ^c   Clegg, W J ^d   Hultman, L ^e  

^a UNIVERSITY OF LEOBEN   (Austria)

^b IMDEA MATERIALS INSTITUTE   (Spain)

^c CHEMNITZ UNIVERSITY OF TECHNOLOGY   (Germany)

^d UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^e LINKÖPING UNIVERSITY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON FILMS; DEFORMATION; ELECTRON MICROSCOPY; EPITAXIAL GROWTH; LITHOGRAPHY; MATERIALS SCIENCE; SILICON; SILICON WAFERS; SINGLE CRYSTALS; SOLIDS; SUBSTRATES; THICK FILMS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; VICKERS HARDNESS TESTING;

CARBON NITRIDE THIN FILMS; CRYSTAL SI (C SI); DEFORMATION PATTERNS; ELASTIC BEHAVIORS; GRAPHENE SHEETS; INDENTATION RESPONSE; INDENTER; SI(2 1 1) SUBSTRATES; SUPERELASTIC;

CARBON NITRIDE;

EID: 46449136630     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2939716     Document Type: Article

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