-
1
-
-
84960259042
-
-
edited by V. Bakshi (SPIE, Bellingham, WA); " Special cluster on extreme ultraviolet light sources for semiconductor manufacturing," J. Phys. D (2004).
-
EUV Sources for Lithography, edited by, V. Bakshi, (SPIE, Bellingham, WA, 2006); " Special cluster on extreme ultraviolet light sources for semiconductor manufacturing.," J. Phys. D 37 (2004).
-
(2006)
EUV Sources for Lithography
, vol.37
-
-
-
2
-
-
0000779911
-
-
0021-8979 10.1063/1.1287220.
-
F. N. Beg, I. Ross, A. Lorentz, J. F. Worley, A. E. Dangor, and M. G. Haines, J. Appl. Phys. 0021-8979 10.1063/1.1287220 88, 3225 (2000).
-
(2000)
J. Appl. Phys.
, vol.88
, pp. 3225
-
-
Beg, F.N.1
Ross, I.2
Lorentz, A.3
Worley, J.F.4
Dangor, A.E.5
Haines, M.G.6
-
4
-
-
0001360435
-
-
0034-6748 10.1063/1.1150041.
-
J. J. Rocca, Rev. Sci. Instrum. 0034-6748 10.1063/1.1150041 70, 3799 (1999).
-
(1999)
Rev. Sci. Instrum.
, vol.70
, pp. 3799
-
-
Rocca, J.J.1
-
5
-
-
84865040439
-
-
Proceedings of the Fifth International Conference on Dense Z-Pinches, edited by J. Davis (unpublished)
-
Yu. D. Korolev, O. B. Frants, V. G. Geyman, R. V. Ivashov, N. V. Landl, and I. A. Shemyakin, Proceedings of the Fifth International Conference on Dense Z-Pinches, 2002, edited by, J. Davis, (unpublished), pp. 149-152.
-
(2002)
, pp. 149-152
-
-
Korolev, Yu.D.1
Frants, O.B.2
Geyman, V.G.3
Ivashov, R.V.4
Landl, N.V.5
Shemyakin, I.A.6
-
6
-
-
0032614398
-
-
0003-6935
-
K. Bergmann, G. Schriever, O. Rosier, M. Müller, W. Neff, and R. Lebert, Appl. Opt. 38, 5413 (1999). 0003-6935
-
(1999)
Appl. Opt.
, vol.38
, pp. 5413
-
-
Bergmann, K.1
Schriever, G.2
Rosier, O.3
Müller, M.4
Neff, W.5
Lebert, R.6
-
7
-
-
33745614594
-
-
0277-786X 10.1117/12.657066.
-
J. Pankert, R. Apetz, K. Bergmann, M. Damen, G. Derra, O. Franden, M. Janssen, J. Jonkers, J. Klein, H. Kraus, T. Krücken, A. List, M. Loeken, A. Mader, C. Metzmacher, W. Neff, S. Probst, R. Prümmer, O. Rosier, S. Schwabe, S. Seiwert, G. Siemons, D. Vaudrevange, D. Wagemann, A. Weber, P. Zink, and O. Zitzen, Proc. SPIE 0277-786X 10.1117/12.657066 6151, 61510Q (2006).
-
(2006)
Proc. SPIE
, vol.6151
-
-
Pankert, J.1
Apetz, R.2
Bergmann, K.3
Damen, M.4
Derra, G.5
Franden, O.6
Janssen, M.7
Jonkers, J.8
Klein, J.9
Kraus, H.10
Krücken, T.11
List, A.12
Loeken, M.13
Mader, A.14
Metzmacher, C.15
Neff, W.16
Probst, S.17
Prümmer, R.18
Rosier, O.19
Schwabe, S.20
Seiwert, S.21
Siemons, G.22
Vaudrevange, D.23
Wagemann, D.24
Weber, A.25
Zink, P.26
Zitzen, O.27
more..
-
8
-
-
46449126090
-
-
(Ref.), 3213.
-
T. Krücken, K. Bergmann, L. Juschkin, and R. Lebert, EUV Sources for Lithography (Ref.), p. 3213.
-
EUV Sources for Lithography
-
-
Krücken, T.1
Bergmann, K.2
Juschkin, L.3
Lebert, R.4
-
9
-
-
0038730824
-
-
1155-4339
-
P. Guttmann, B. Niemann, S. Rehbein, Ch. Knöchel, D. Rudolph, and G. Schmahl, J. Phys. IV 104, 85 (2003). 1155-4339
-
(2003)
J. Phys. IV
, vol.104
, pp. 85
-
-
Guttmann, P.1
Niemann, B.2
Rehbein, S.3
Knöchel, Ch.4
Rudolph, D.5
Schmahl, G.6
-
10
-
-
21844478875
-
-
AIP Conf. Proc. No. 507, edited by W. Meyer-Ilse, T. Warwick, and D. Attwood (AIP, New York)
-
P. Guttmann, B. Niemann, J. Thieme, U. Wiesemann, D. Rudolph, and G. Schmahl, X-Ray Microscopy, AIP Conf. Proc. No. 507, edited by, W. Meyer-Ilse, T. Warwick, and, D. Attwood, (AIP, New York, 2000), pp. 411-415.
-
(2000)
X-Ray Microscopy
, pp. 411-415
-
-
Guttmann, P.1
Niemann, B.2
Thieme, J.3
Wiesemann, U.4
Rudolph, D.5
Schmahl, G.6
-
12
-
-
34247246221
-
-
0022-2720 10.1111/j.1365-2818.2007.01765.x.
-
P. A. C. Takman, H. Stollenberg, G. A. Johansson, A. Holmberg, M. Lindblom, and H. M. Hertz, J. Microsc. 0022-2720 10.1111/j.1365-2818.2007.01765. x 226, 175 (2007).
-
(2007)
J. Microsc.
, vol.226
, pp. 175
-
-
Takman, P.A.C.1
Stollenberg, H.2
Johansson, G.A.3
Holmberg, A.4
Lindblom, M.5
Hertz, H.M.6
-
13
-
-
33644694668
-
-
0031-9155 10.1088/0031-9155/51/6/N01.
-
K. W. Kim, Y. M. Kwon, K. Y. Nam, J. H. Lim, K. G. Kim, K. S. Chon, H. H. Kim, D. E. Kim, J. G. Kim, B. N. Ahn, H. J. Shin, S. Y. Rah, K. H. Kim, J. S. Chae, D. G. Gweon, D. W. Kang, S. H. Kang, J. Y. Min, K. S. Choi, S. E. Yoon, E. A. Kim, Y. Namba, and K. H. Yoon, Phys. Med. Biol. 0031-9155 10.1088/0031-9155/51/6/N01 51, N99 (2006).
-
(2006)
Phys. Med. Biol.
, vol.51
, pp. 99
-
-
Kim, K.W.1
Kwon, Y.M.2
Nam, K.Y.3
Lim, J.H.4
Kim, K.G.5
Chon, K.S.6
Kim, H.H.7
Kim, D.E.8
Kim, J.G.9
Ahn, B.N.10
Shin, H.J.11
Rah, S.Y.12
Kim, K.H.13
Chae, J.S.14
Gweon, D.G.15
Kang, D.W.16
Kang, S.H.17
Min, J.Y.18
Choi, K.S.19
Yoon, S.E.20
Kim, E.A.21
Namba, Y.22
Yoon, K.H.23
more..
-
16
-
-
0942289320
-
-
1063-651X 10.1103/PhysRevE.68.056403.
-
E. R. Kieft, J. J. A. M. van der Mullen, G. M.-W. Kroesen, and V. Banine, Phys. Rev. E 1063-651X 10.1103/PhysRevE.68.056403 68, 056403 (2003).
-
(2003)
Phys. Rev. e
, vol.68
, pp. 056403
-
-
Kieft, E.R.1
Van Der Mullen, J.J.A.M.2
Kroesen, G.M.-W.3
Banine, V.4
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