Pinch plasma source for X-ray microscopy with nanosecond exposure time

Journal of X-Ray Science and Technology

Volumn 6, Issue 2, 1996, Pages 107-140

  Lebert, R ^a   Neff, W ^b   Rothweiler, D ^a  

^a RWTH AACHEN UNIVERSITY   (Germany)

^b FRAUNHOFER INSTITUTE FOR LASER TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001419429     PISSN: 08953996     EISSN: None     Source Type: Journal    
DOI: 10.1006/jxra.1996.9999     Document Type: Article

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