Characteristics of parallel internal-type inductively coupled plasmas for large area flat panel display processing

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 43, Issue 7 A, 2004, Pages 4373-4375

  Kim, Kyong Nam ^a   Lee, Young June ^a   Jung, Seung Jae ^a   Yeom, Geun Young ^a  

^a Sungkyunkwan University   (South Korea)

Author keywords

Etching; Inductively coupled plasma; Langmuir probe; Large area plasma; Parallel internal type antenna; Uniformity

Indexed keywords

ANTENNAS; DEPOSITION; DIELECTRIC MATERIALS; ELECTRIC IMPEDANCE; ETCHING; FLAT PANEL DISPLAYS; FLUORINE; PRESSURE EFFECTS; SILICON COMPOUNDS; VOLTAGE MEASUREMENT;

LANGMUIR PROBE; LARGE-AREA PLASMA; PARALLEL INTERNAL-TYPE ANTENNA; UNIFORMITY ANALYSIS;

INDUCTIVELY COUPLED PLASMA;

EID: 4644220153     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.43.4373     Document Type: Article

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