Inductively coupled plasma source with internal straight antenna

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 40, Issue 9 A, 2001, Pages 5419-5423

  Kanoh, M ^a   Suzuki, K ^a   Tonotani, J ^a   Aoki, K ^a   Yamage, M ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

Ashing; Etching; Inductively coupled plasma; Internal antenna; Plasma source; Power transfer efficiency; Sputter

Indexed keywords

ANTENNAS; CARRIER CONCENTRATION; ELECTRIC FIELDS; INDUCTIVELY COUPLED PLASMA; PLASMA ETCHING; PRESSURE; SPUTTERING;

ANTENNA SPUTTERING; ASHING; INTERNAL ANTENNA; QUARTZ PIPE ETCHING;

PLASMA SOURCES;

EID: 0035456877     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.40.5419     Document Type: Article

References (7)