Control of high-density plasma sources for CVD and etching

Vacuum

Volumn 48, Issue 7-9, 1997, Pages 659-664

  Suzuki, K ^a   Sugai, H ^a   Nakamura, K ^a   Ahn, T H ^a   Nagatsu, M ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ETCHING; HELICONS; MICROWAVES; THIN FILMS;

PLASMA CONTROL;

PLASMA SOURCES;

EID: 0031221493     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0042-207x(97)00054-7     Document Type: Article

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