Evaluation of surface roughness and nanostructure of indium tin oxide (ITO) films by atomic force microscopy

Scanning

Volumn 30, Issue 3, 2008, Pages 232-239

  Kavei, G ^a   Zare, Y ^a   Mohammadi Gheidari, A ^a  

^a MATERIALS AND ENERGY RESEARCH CENTER   (Iran)

Author keywords

Atomic force microscopy (AFM); Image analysis; Scanning probe microscopy (SPM); Transparent conducting oxide (TCO)

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; ATOMIC PHYSICS; ATOMS; ELECTRIC CONDUCTIVITY; FRICTION; GLASS; IMAGE ANALYSIS; INDIUM; MICROSCOPIC EXAMINATION; OPTICAL CONDUCTIVITY; OPTICAL PROPERTIES; OXIDE FILMS; PHOTOACOUSTIC EFFECT; PRESSURE; SCANNING; SCANNING PROBE MICROSCOPY; SEMICONDUCTING CADMIUM TELLURIDE; SPUTTERING; STEEL ANALYSIS; SURFACE PROPERTIES; SURFACE ROUGHNESS; TIN; TITANIUM COMPOUNDS;

(1 1 0) SURFACE; (P ,P ,T) MEASUREMENTS; (PL) PROPERTIES; ANNEALING PROCESSING; ATOMIC FORCE (AF); ELECTRICAL CONDUCTIVITY; FILM SURFACES; INDIUM TIN OXIDE (ITO); INDIUM TIN OXIDE (ITO) FILMS; NANO STRUCTURING; OPTICAL (PET) (OPET); OPTICAL TRANSMITTANCE (T); RADIO FREQUENCY (RF) SPUTTERING; ROOM-TEMPERATURE (RT); SCANNING PROBES; SODA-LIME GLASS (SLG); SPUTTERING GAS PRESSURE; SPUTTERING GASES; SPUTTERING RATES;

OPTICAL FILMS;

ARGON; CALCIUM OXIDE; GLASS; INDIUM; INDIUM TIN OXIDE; SODA LIME GLASS; TIN;

ARTICLE; ATOMIC FORCE MICROSCOPY; ELECTRIC CONDUCTIVITY; EVALUATION; GAS; HIGH TEMPERATURE; IMAGE ANALYSIS; OPTICS; PARAMETER; PRESSURE; PRIORITY JOURNAL; RADIOFREQUENCY; RADIOFREQUENCY SPUTTERING SYSTEM; ROOM TEMPERATURE; SCANNING PROBE MICROSCOPY; THICKNESS;

EID: 46349085421     PISSN: 01610457     EISSN: None     Source Type: Journal    
DOI: 10.1002/sca.20104     Document Type: Article

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