Structural determination of nanocrystalline Si films using ellipsometry and Raman spectroscopy

Thin Solid Films

Volumn 516, Issue 20, 2008, Pages 6863-6868

  Ram, Sanjay K ^a   Islam, Md N ^b   Roca i Cabarrocas, P ^c   Kumar, Satyendra ^a  

^a INDIAN INSTITUTE OF TECHNOLOGY KANPUR   (India)

^b INDIAN SPACE RESEARCH ORGANISATION   (India)

^c LABORATOIRE DE PHYSIQUE DES INTERFACES ET DES COUCHES MINCES   (France)

Author keywords

Atomic force microscopy (AFM); Ellipsometry; Growth mechanism; Raman spectroscopy; Silicon; Structural properties; Thin films

Indexed keywords

ARCHITECTURAL ACOUSTICS; SILICON; SPECTRUM ANALYSIS; THIN FILMS;

MICRO-CRYSTALLINE SILICON; NANOCRYSTALLINE SI FILMS; SINGLE PHASING; STRUCTURAL DETERMINATION;

NANOCRYSTALLINE SILICON;

EID: 45849103893     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.12.113     Document Type: Article

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