Laser annealing of implanted semiconductor layers - One bridge to nano-processing

Materials Science Forum

Volumn 573-574, Issue , 2008, Pages 237-256

  Geiler, Hans D ^a  

^a JenaWave Engineering and Consulting   (Germany)

Author keywords

Electrical activation; Heat dissipation; Heat pulses; Heating regime; Laser annealing; Silicon; Thermally activated process; Thermostress

Indexed keywords

ANNEALING; CHEMICAL ACTIVATION; HEAT LOSSES; PROCESS CONTROL; RAPID THERMAL PROCESSING; SEMICONDUCTOR DEVICE MANUFACTURE; SILICON;

ELECTRICAL ACTIVATION; HEAT PULSE; HEATING REGIMES; LASER ANNEALING; THERMALLY ACTIVATED PROCESS; THERMOSTRESS;

SEMICONDUCTOR LASERS;

EID: 45749084905     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/msf.573-574.237     Document Type: Article

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