Investigation of laser induced diffusion and annealing processes of arsenic‐implanted silicon crystals

physica status solidi (a)

Volumn 41, Issue 2, 1977, Pages K171-K173

  Geiler, H D ^a   Gotz G ^a   Klinge, K D ^a   Triem, N ^a  

^a FRIEDRICH SCHILLER UNIVERSITY JENA   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84983869289     PISSN: 00318965     EISSN: 1521396X     Source Type: Journal    
DOI: 10.1002/pssa.2210410261     Document Type: Article

References (5)