Merits and demerits of light absorbers for ultra-shallow junction formation by green laser annealing

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 237, Issue 1-2, 2005, Pages 136-141

  Matsuno, Akira ^a,b   Takii, Eisuke ^a   Eto, Takanori ^a   Kurobe, Ken Ichi ^a   Shibahara, Kentaro ^a  

^a HIROSHIMA UNIVERSITY   (Japan)

^b Phoeton Corp   (Japan)

Author keywords

Absorber; Green laser; Laser annealing; Shallow junction; Si

Indexed keywords

ANNEALING; ANTIMONY; DIFFUSION; DOPING (ADDITIVES); LASER APPLICATIONS; SOLID STATE LASERS;

ABSORBERS; GREEN LASERS; LASER ANNEALING; SHALLOW JUNCTIONS;

LIGHT ABSORPTION;

EID: 23444456183     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2005.04.088     Document Type: Conference Paper

References (9)

1. B. Yu, Y. Wang, H. Wang, Q. Xiang, C. Riccobene, S. Talwar, and M. Lin IEEE IEDM Tech. Digest 1999 348
2. K. Kurobe, Y. Ishikawa, K. Kagawa, Y. Niwatsukino, A. Matsuno, and K. Shibahara Ext. Abst. Fabricat. Char., Model. Ultra-Shallow Doping Profiles Semicond. 2003 98
3. A. Shima, H. Ashihara, T. Mine, Y. Goto, M. Horiuchi, Y. Wang, S. Talwar, and A. Hiraiwa IEEE IEDM Tech. Digest 2003 493
4. T. Ito, K. Suguro, M. Tamura, T. Taniguchi, Y. Ushiku, T. Iinuma, T. Itani, M. Yoshioka, T. Owada, Y. Imaoka, H. Murayama, and T. Kusuda Ext. Abst. Int. Workshop Junction Technol. 2002 23
5. A.G. Cullis Rep. Prog. Phys. 48 1985 1155
6. Y. Yonezawa, and T. Minamikawa Rep. Ind. Res. Inst. Ishikawa 1999 48
7. J.F. Shackelford, and W. Alexander CRC Materials Science and Engineering Handbook third ed. 2000 CRC Press LLC Boca Raton, FL, USA
8. K. Kurobe, Y. Ishikawa, K. Kagawa, Y. Niwatsukino, A. Matusno, and K. Shibahara Ext. Abstr. Int. Workshop Junction Technol. 2002 35
9. J.M. Liu, H. Kurz, and N. Bloembergen Appl. Phys. Lett. 41 1982 643