Integrated diagnostics of magnetron sputtering discharge

Thin Solid Films

Volumn 516, Issue 19, 2008, Pages 6542-6547

  Britun, N ^a   Han, J G ^a  

^a Sungkyunkwan University   (South Korea)

Author keywords

Fabry Perot; Film structure; LIF; Magnetron sputtering; Surface temperature

Indexed keywords

ABSORPTION; ABSORPTION SPECTROSCOPY; ARGON; DISCHARGE (FLUID MECHANICS); DOPPLER EFFECT; ELECTROMAGNETIC WAVE EMISSION; ELECTROMAGNETIC WAVES; EMISSION SPECTROSCOPY; FABRY-PEROT INTERFEROMETERS; FLUID MECHANICS; FLUORESCENCE; INTERFEROMETERS; INTERFEROMETRY; LASER DIAGNOSTICS; LASER OPTICS; LASERS; LIGHT EMISSION; LUMINESCENCE; MAGNETRONS; PULSED LASER DEPOSITION;

APPLIED (CO); DOPPLER BROADENING; EMISSION LINES; FABRY-PEROT; FABRY-PEROT (F-P) INTERFEROMETRY; INTEGRATED DIAGNOSTICS (ID); LASER-INDUCED FLUORESCENCE (LIF); MAGNETRON DISCHARGES; OPTICAL ABSORPTION SPECTROSCOPY (DOAS); TI ATOMS; WIDE-RANGE; WORKING PRESSURES;

MAGNETRON SPUTTERING;

EID: 45449119677     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.11.027     Document Type: Article

References (24)

1. Wasa K., and Hayakawa S. Rev. Sci. Instrum. 40 5 (1969) 693
2. Thornton J.A. Thin Solid Films 54 (1978) 23
3. Konstantinidis S., Hemberg A., Dauchot J.P., and Hecq M. J. Vac. Sci. Technol., B 25 (2007) L19
4. Window B. Surf. Coat. Technol. 71 (1995) 93
5. Minayeva O.B., and Hopwood J. J. Appl. Phys. 94 (2003) 2821
6. Singh H., Coburn J.W., and Graves D.B. J. Vac. Sci. Technol., A, Vac. Surf. Films 19 3 (2001) 718
7. Leroy O., de Poucques L., Boisse-Laporte C., Ganciu M., Teule-Gay L., and Touzeau M. J. Vac. Sci. Technol., A, Vac. Surf. Films 22 (2004) 192
8. Kobayashi K., and Uehara Y. This Solid Films 193/194 (1990) 146
9. Steffens K.L., and Sobolewski M.A. J. Appl. Phys. 96 (2004) 71
10. Born M., and Wolf E. Principles of optics. 6th ed. (1986), Pergamon Press, New York 329
11. Ball L.T., Turner I.S., McKenzie D.R., and Smelt J.M. J. Appl. Phys 59 (1986) 720
12. Poluektov N.P., Kharchenko V.N., and Kamyschov I.A. Plasma Sources Sci. Technol. 12 (2003) 449
13. Choi Y.W., Bowden M., and Muraoka K. Jpn. J. Appl. Phys. 35 (1996) 5858
14. Lamara T., Hugon R., and Bougdira J. Plasma Sources Sci. Technol. 15 (2006) 526
15. Hu H., Saga T., Kobayashi T., and Taniguchi N. Meas. Sci. Technol. 11 (2000) 698
16. Mitchell A.C.G., and Zemansky M.W. Resonance Radiation and Excited Atoms (1961), Cambridge University Press, Cambridge 98
17. Otorbaev D.K., Buuron A.J.M., van de Sanden M.C.M., Meulenbroeks R.F.G., and Schram D.C. J. Phys., D: Appl. Phys. 28 (1995) 1362
18. Britun N., Gaillard M., Oh S.-G., and Han J.G. J. Phys., D: Appl. Phys. 40 (2007) 5098
19. Britun, N. Gaillard, M. Kim, Y.M. Kim, K.S. and Han, J.G., Metals and Materials International, in press.
20. Nafarizal N., Takada N., Shibagaki K., Nakamura K., Sago Y., and Sasaki K. Jpn. J. Appl. Phys. 44 (2005) L737
21. de Poucques L., Imbert J.C., Boisse-Laporte C., Vasina P., Bretagne J., Teulé-Gay L., and Touzeau M. Plasma Sources Sci. Technol. 14 (2005) 321
22. Rossnagel S.M. J. Vac. Sci. Technol., A, Vac. Surf. Films 6 (1988) 19
23. In: Rossnagel S.M., Cuomo J.J., and Westwood W.D. (Eds). Handbook of Plasma Processing Technology (1989), Noyes Publications, New Jersey 177
24. Wu S.Z. J. Appl. Phys. 98 (2005) 083301