Synthesis of crystalline C3N4 by MPCVD

Applied Surface Science

Volumn 148, Issue 1, 1999, Pages 50-55

  Shi, D X ^a   Zhang, X F ^a   Yuan, L ^a   Gu, Y S ^b   Zhang, Y P ^b   Duan, Z J ^b   Chang, X R ^b   Tian, Z Z ^b   Chen, N X ^b  

^a Beijing Lab of Electron Microscopy   (China)

^b UNIVERSITY OF SCIENCE AND TECHNOLOGY BEIJING   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; CRYSTAL ATOMIC STRUCTURE; CRYSTALLINE MATERIALS; HARDNESS; MICROWAVES; PLASMA APPLICATIONS; PLATINUM; SILICON WAFERS; SUBSTRATES; SYNTHESIS (CHEMICAL); THIN FILMS;

CARBON NITRIDE; MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION (MPCVD);

NITRIDES;

EID: 0032628055     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(99)00135-X     Document Type: Article

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