메뉴 건너뛰기




Volumn 11, Issue 4, 2007, Pages 519-528

Improvement of multiple-level cell endurance of NAND flash memories using HfO2/ZrO2 charge storage layer

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC MATERIALS; FLASH MEMORY; HAFNIUM OXIDES; HIGH-K DIELECTRIC; LOGIC GATES; NAND CIRCUITS; RELIABILITY; SILICON; ZIRCONIA;

EID: 45249098565     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.2779587     Document Type: Conference Paper
Times cited : (1)

References (13)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.