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Volumn 11, Issue 4, 2007, Pages 519-528
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Improvement of multiple-level cell endurance of NAND flash memories using HfO2/ZrO2 charge storage layer
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Author keywords
[No Author keywords available]
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Indexed keywords
DIELECTRIC MATERIALS;
FLASH MEMORY;
HAFNIUM OXIDES;
HIGH-K DIELECTRIC;
LOGIC GATES;
NAND CIRCUITS;
RELIABILITY;
SILICON;
ZIRCONIA;
CHARGE STORAGE;
DEGRADATION FACTOR;
ENDURANCE RELIABILITY;
HIGH- K;
MULTIPLE-LEVEL CELLS;
NAND FLASH MEMORY;
OVER-ERASURE;
THERMALLY INDUCED;
SILICON COMPOUNDS;
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EID: 45249098565
PISSN: 19385862
EISSN: 19386737
Source Type: Conference Proceeding
DOI: 10.1149/1.2779587 Document Type: Conference Paper |
Times cited : (1)
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References (13)
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