Fabrication of periodically polarity-inverted ZnO films

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 26, Issue 3, 2008, Pages 1120-1123

  Minegishi, T ^a   Ishizawa, A ^b   Kim, J ^c   Kim, D ^c   Ahn, S ^c   Park, S ^a   Park, J ^a   Im, I ^a   Oh, D C ^d   Nakano, H ^b   Fujii, K ^a   Jeon, H ^b   Yao, T ^a,e  

^a TOHOKU UNIVERSITY   (Japan)

^b NTT Basic Research Laboratories   (Japan)

^c Seoul National University   (South Korea)

^d Hoseo University   (South Korea)

^e TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; MOLECULAR BEAM EPITAXY; NONLINEAR OPTICS; ONE DIMENSIONAL; OPTICAL DEVICES; ZINC OXIDE;

NONLINEAR OPTICAL DEVICES; PLASMA-ASSISTED MOLECULAR BEAM EPITAXY; POLARITY-INVERTED STRUCTURES; SCANNING PIEZORESPONSE MICROSCOPY;

THIN FILMS;

EID: 44649168733     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2905244     Document Type: Article

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