Shrinking of spin-on-glass films induced by synchrotron radiation and its application to three-dimensional microfabrications

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 43, Issue 6 B, 2004, Pages 3941-3944

  Rahman, Md Mashiur ^a   Tero, Ryugo ^b   Urisu, Tsuneo ^a,b  

^a GRADUATE UNIVERSITY FOR ADVANCED STUDIES   (Japan)

^b INSTITUTE FOR MOLECULAR SCIENCE   (Japan)

Author keywords

Atomic force microscopy; Cure; Etching process; Fourier transform infrared spectroscopy; Scanning electron microscopy; Silicon oxides; Spin on glass; Synchrotron radiation

Indexed keywords

ELECTRON BEAM CURING; PRE-ANNEALING; SPIN-ON-GLASS FILMS; VOLUME RATIO;

ATOMIC FORCE MICROSCOPY; ATTENUATION; ETCHING; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MASKS; PHOTONS; SHRINKAGE; SYNCHROTRON RADIATION;

THIN FILMS;

EID: 4444237680     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.43.3941     Document Type: Conference Paper

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