Direct etching of spin-on-glass films exposed using synchrotron radiation

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 41, Issue 6 B, 2002, Pages 4304-4306

  Taniguchi, Jun ^a,b   Kanda, Kazuhiro ^a   Haruyama, Yuichi ^a   Matsui, Shinji ^a   Tokunaga, Makoto ^a   Miyamoto, Iwao ^a  

^a TOKYO UNIVERSITY OF SCIENCE   (Japan)

^b UNIVERSITY OF HYOGO   (Japan)

Author keywords

Direct etching; Polymethylmethacrylate (PMMA); Spin on glass films; Synchrotron radiation; X ray photoelectron spectroscopy (XPS)

Indexed keywords

DESORPTION; ETCHING; POLYMETHYL METHACRYLATES; SILICA; SPIN GLASS; SYNCHROTRON RADIATION; X RAY PHOTOELECTRON SPECTROSCOPY;

SPIN-ON-GLASS FILMS;

THIN FILMS;

EID: 0036614391     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.41.4304     Document Type: Article

References (4)