SR-stimulated etching and OMVPE growth for semiconductor nanostructure fabrication

Materials Science and Engineering B: Solid-State Materials for Advanced Technology

Volumn 74, Issue 1, 2000, Pages 7-11

  Nonogaki, Y ^a   Hatate, H ^a   Oga, R ^a   Yamamoto, S ^a   Fujiwara, Y ^a   Takeda, Y ^a   Noda, H ^b   Urisu, T ^b  

^a NAGOYA UNIVERSITY   (Japan)

^b INSTITUTE FOR MOLECULAR SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ETCHING; IRRADIATION; MASKS; METALLORGANIC VAPOR PHASE EPITAXY; RADIATION EFFECTS; SEMICONDUCTING INDIUM PHOSPHIDE; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR GROWTH; SILICA; SUBSTRATES; SYNCHROTRON RADIATION;

ORDERED ARRAYS; SELECTIVE AREA GROWTH;

NANOSTRUCTURED MATERIALS;

EID: 0033739904     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(99)00525-5     Document Type: Article

References (9)

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