Generation of SI nanoparticles using plasma technology for novel device and energy storage application

ASME International Mechanical Engineering Congress and Exposition, Proceedings

Volumn 11 PART A, Issue , 2008, Pages 263-266

  Kim, Kwangsu ^a   Kim, Youngjin ^a   Cho, Yonghyun ^a   Kim, Taesung ^a  

^a Sungkyunkwan University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ENERGY STORAGE; INDUCTIVELY COUPLED PLASMA; SEMICONDUCTING FILMS; SILICON; SIZE DISTRIBUTION; TRANSMISSION ELECTRON MICROSCOPY;

ENERGY DEVICES; PULSE PLASMA TECHNOLOGY; SILICON NANOPARTICLES;

NANOPARTICLES;

EID: 44349142743     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1115/IMECE2007-41800     Document Type: Conference Paper

References (13)

1. Michele, L.O. and et al., 2001, "Ultraclean Two-Stage Aerosol Reactor for Production of Oxide-Passivated Silicon Nanoparticles for Novel Memory Devices", Journal of The Electrochemical Society, 148, pp. G265-G270.
2. Koliopoulou, S. and et al., 2006, "Metal nano-floating gate memory devices fabricated at low temperature", Microelectronic Engineering, 83, pp. 1563-1566.
3. Oda, S., 2003, "NeoSilicon materials and silicon nanodevices", Materials Science and Engineering B, 101, pp. 19-23.
4. Shirai, H. and et al., 2003, "Nanocrystalline Silicon Dots Fabricated by Pulse RF Plasma-Enhanced Chemical Vapor Deposition of SiC14-and-H2 Mixture", Japanese journal of Applied Physics Part 2, Letters, 42, pp. L1191-L1194.
5. Y., F. and et al., 2000, "Carrier conduction in a Sinanocrystal-based single electron transistor-I. Effect of gate bias", Superlattice Microstructure, 28, pp. 177-187.
6. Ameya, B. and et al., 2003, "Synthesis of highly oriented, single-crystal silicon nanoparticles in a lowpressure, inductively coupled plasma", Journal of Applied Physics, 94, pp. 1969-1974.
7. Kim, H. and et al., 2006, "Parrallel patterning of nanoparticles via electrodynamic focusing of charged aerosols", Nature Nanotechnology, 1, pp. 117-121.
8. Suzuki, M. and et al., 2007, "Negative Dielectrophoretic Patterning with Colloidal Particles and Encapsulation into a Hydrogel", Langmuir, 23, pp. 4088-4094.
9. Swihart, M.T., 2003, "Vapor-phase synthesis of nanoparticles", Current Opinion in Colloid and Interface Science, 8, pp. 127-133.
10. Bouchoule, A. and Boufendi, L., 1993, "Particulate formation and dusty plasma behaviour in argon-silane RF discharge", Plasmasources Science and Technology, 2, pp. 204-213.
11. Oda, S., 1997, "Preparation of nanocrystalline silicon quantum dot structure by a digital plasma process", Advances in Colloid and Interface Science, 71-72, pp. 31-47.
12. Gorla, C.R. and et al., 1997, "Silicon and germanium nanoparticle formation in an inductively coupled plasma reactor", Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 15, pp. 860-864.
13. Plasmart Co.: http://www.plasmart.com