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Volumn 71-72, Issue , 1997, Pages 31-47
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Preparation of nanocrystalline silicon quantum dot structure by a digital plasma process
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Author keywords
[No Author keywords available]
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Indexed keywords
ATOMIC FORCE MICROSCOPY;
CURRENT VOLTAGE CHARACTERISTICS;
ELECTRON TUNNELING;
ELECTRONIC STRUCTURE;
NANOSTRUCTURED MATERIALS;
NUCLEATION;
PHOTOLUMINESCENCE;
PLASMA APPLICATIONS;
SEMICONDUCTING SILICON;
SURFACE STRUCTURE;
TRANSMISSION ELECTRON MICROSCOPY;
COULOMB BLOCKADE;
DIGITAL PLASMA PROCESSING;
PULSED PLASMA PROCESS;
SEMICONDUCTOR QUANTUM DOTS;
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EID: 0031222165
PISSN: 00018686
EISSN: None
Source Type: Journal
DOI: 10.1016/S0001-8686(97)00008-0 Document Type: Article |
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Times cited : (28)
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References (17)
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