Effect of surface modification by thermally oxidization and HF etching on UV photoluminescence emission of porous silicon

Applied Surface Science

Volumn 254, Issue 18, 2008, Pages 5655-5659

  Song, Huabing ^a   Li, Zhiwei ^a   Chen, Hao ^a   Jiao, Zhifeng ^a   Yu, Zhou ^a   Jin, Yong ^a   Yang, Zhimei ^a   Gong, Min ^a   Sun, Xiaosong ^a  

^a SICHUAN UNIVERSITY   (China)

Author keywords

HF etching; Oxidization; Oxygen defect; Photoluminescence; Porous silicon

Indexed keywords

ABSORPTION; DEFECTS; ETCHING; FUNCTIONAL GROUPS; OXIDATION; PHOTOLUMINESCENCE;

OXIDIZATION; OXYGEN DEFECTS; SILANOL GROUPS;

POROUS SILICON;

EID: 44349129702     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2008.03.146     Document Type: Review

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