Cross-sectional AFM study of etching kinetics of oxidized porous silicon

Physica Status Solidi (A) Applied Research

Volumn 201, Issue 4, 2004, Pages 756-761

  Poler, J C ^a   Schmedake, Thomas A ^a   Ye, Weijun ^a  

^a UNIVERSITY OF NORTH CAROLINA AT CHARLOTTE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ETCHING; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MORPHOLOGY; NANOSTRUCTURED MATERIALS; OXIDATION; OZONE; PHOTOLUMINESCENCE; POROUS MATERIALS; REACTION KINETICS;

NANOPARTICLES; NANOWIRES;

SILICON;

EID: 1942506789     PISSN: 00318965     EISSN: None     Source Type: Journal    
DOI: 10.1002/pssa.200306767     Document Type: Article

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