Microstructure, heat treatment, and oxidation study of porous silicon formed on moderately doped p-type silicon

Journal of Applied Physics

Volumn 81, Issue 1, 1997, Pages 492-496

  Zheng, D W ^a   Huang, Y P ^a   He, Z J ^a   Li, A Z ^a   Tang, T A ^a   Kwor, R ^b   Cui, Q ^a   Zhang, X J ^a  

^a FUDAN UNIVERSITY   (China)

^b University of Colorado at Colorado Springs   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0009311971     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.364107     Document Type: Article

References (8)

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