Photoacoustic and photoluminescence studies of porous silicon etched by low-concentration hydrofluoric acid

Journal of Applied Physics

Volumn 88, Issue 11, 2000, Pages 6444-6450

  Toyoda, T ^a   Takahashi, T ^a   Shen, Q ^a  

^a UNIVERSITY OF ELECTRO COMMUNICATIONS   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000408222     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1289220     Document Type: Article

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