Thickness dependence of electrical properties of PZT films deposited on metal substrates by laser-assisted aerosol deposition

IEEE Transactions on Ultrasonics, Ferroelectrics, and Frequency Control

Volumn 55, Issue 5, 2008, Pages 1009-1016

  Baba, So ^a   Tsuda, Hiroki ^a   Akedo, Jun ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AEROSOLS; DEPOSITION; EMISSION SPECTROSCOPY; FILM THICKNESS; LEAD COMPOUNDS; PERMITTIVITY; PIEZOELECTRIC ACTUATORS; SUBSTRATES;

ACTUATOR DEVICES; THICKNESS DEPENDENCE;

THICK FILMS;

ALUMINUM OXIDE; LEAD; LEAD TITANATE ZIRCONATE; TITANIUM; ZIRCONIUM;

AEROSOL; ARTICLE; ARTIFICIAL MEMBRANE; CHEMISTRY; CRYSTALLIZATION; ELECTRIC CONDUCTIVITY; LASER; MATERIALS TESTING; METHODOLOGY;

AEROSOLS; ALUMINUM OXIDE; CRYSTALLIZATION; ELECTRIC CONDUCTIVITY; LASERS; LEAD; MATERIALS TESTING; MEMBRANES, ARTIFICIAL; TITANIUM; ZIRCONIUM;

EID: 44249122389     PISSN: 08853010     EISSN: None     Source Type: Journal    
DOI: 10.1109/TUFFC.2008.747     Document Type: Conference Paper

References (16)

1. S.-M. Nam, N. Mori, H. Kakemoto, S. Wada, J. Akedo, and T. Tsurumi, "Alumina thick films as integral substrates using aerosol deposition method," Jpn. J. Appl. Phys., vol. 43, pp. 5414-5418, Aug. 2004.
2. 3 thick films formed by aerosol deposition," Jpn. J. Appl. Phys., vol. 44, pp. 7072-7077, Sep. 2005.
3. 3-coated stainless steel substrate," Appl. Phys. Lett., vol. 81, pp. 4805-4807, Dec. 2002.
4. 3 thin films by RF-magnetron sputtering and their dielectric and piezoelectric properties," Jpn. J. Appl. Phys., vol. 36, pt. 1, pp. 6065-6068, Sep. 1997.
5. 3 thin film prepared by source gas pulse-introduced metalorganic chemical vapor deposition," Jpn. J. Appl. Phys., vol. 39, pt. 2, pp. L996-L998, Oct. 2000.
6. T. Yan, B. E. Jones, R. T. Rakowski, M. J. Tudor, S. P. Beeby, and N. M. White, "Design and fabrication of thick-film PZT-metallic triple beam resonators," Sens. Actuators A, vol. 115, pp. 401-407, June 2004.
7. J. Akedo, "Aerosol deposition of ceramic thick films at room temperature: Densification mechanism of ceramic layers," J. Amer. Ceram. Soc., vol. 89, pp. 1834-1839, June 2006.
8. 3) thick films deposited by aerosol deposition method," Jpn. J. Appl. Phys., vol. 38, pt. 1, pp. 5397-5401, Sep. 1999.
9. 3 thick films prepared for microactuators by aerosol deposition," Appl. Phys. Lett., vol. 77, pp. 1710-1712, Sep. 2000.
10. 3 thick films formed by aerosol deposition method," J. Cryst. Growth, vol. 235, pp. 415-420, Feb. 2002.
11. 2 laser radiation," J. Amer. Ceram. Soc., vol. 88, pp. 1407-1410, June 2005.
12. 2 laser annealing of silicon," J. Appl. Phys., vol. 53, pp. 5634-5640, Aug. 1982.
13. 2 laser," Jpn. J. Appl. Phys., vol. 31, pt. 1, pp. 3037-3040, Sep. 1992.
14. S. K. O'Leary, S. R. Johnson, and P. K. Lim, "The relationship between the distribution of electronic states and the optical absorption spectrum of an amorphous semiconductor: An empirical analysis," J. Appl. Phys., vol. 82, pp. 3334-3340, Oct. 1997.
15. J. Akedo and M. Lebedev, "Aerosol deposition method (ADM): A novel method of PZT thick films producing for microactuators," in Recent Research and Development in Materials Science, vol. 2, Trivandrum, India: Research Signpost Publisher, 2001, pp. 51-77.
16. M. Lebedev and J. Akedo, "Effect of thickness on the piezoelectric properties of lead zirconate titanate films fabricated by aerosol deposition method," Jpn. J. Appl. Phys., vol. 41, pt. 1, pp. 6669-6673, Nov. 2002.