A comparative morphological study of electron beam co-deposited binary optical thin films of HfO2:SiO2 and ZrO2:SiO2

Current Applied Physics

Volumn 8, Issue 5, 2008, Pages 589-602

  Tokas, R B ^a   Sahoo, N K ^a   Thakur, S ^a   Kamble, N M ^a  

^a BHABHA ATOMIC RESEARCH CENTRE   (India)

Author keywords

Atomic force microscopy; Composite film; Correlation functions; Electron beam co evaporation; Optical coating; Thin film morphology

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTRON BEAMS; EVAPORATION; OPTICAL COATINGS; OPTICAL CORRELATION;

CORRELATION FUNCTIONS; ELECTRON BEAM CO-EVAPORATION; THIN FILM MORPHOLOGY;

COMPOSITE FILMS;

EID: 44149098825     PISSN: 15671739     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cap.2007.10.061     Document Type: Article

References (27)

1. Jerman M., Qiao Z., and Mergel D. Appl. Opt. 44 (2005) 3006
2. Sahoo N.K., Thakur S., and Tokas R.B. Thin Solid Films 503 (2006) 85
3. Sankur H.O., DeNatale J., and Gunning W.J. Appl. Opt. 30 (1991) 497
4. Cheliebou F., Boyer A., and Martin L. Thin Solid Films 249 (1994) 86
5. Bousquet P., Flory F., and Roche P. J. Opt. Soc. Am. 71 (1981) 1115
6. Dobrowolski J.A., and Li L. Appl. Opt. 34 (1995) 2934
7. Gunning W.J., Hall R.L., Woodberry F.J., Southwell W.H., and Gluck N.S. Appl. Opt. 28 (1989) 2945
8. Ouellette M.F., Lang R.V., Yan K.L., Bertram R.W., Owles R.S., and Vincent D. J. Vac. Sci. Technol. A 9 (1991) 1188
9. Xu G., Tazawa M., Jin P., and Yoshimura K. Appl. Opt. 42 (2003) 1352
10. Rubbe C., and Duparré A. Thin Solid Films 288 (1996) 8
11. Ferre-Borrull J., Duparré A., and Quesnel E. Appl. Opt. 40 (2001) 2190
12. Marsilli M., Maritan A., Toigoend F., and Banavar J.R. Rev. Mod. Phys. 68 (1996) 963
13. Klapetek P., and Ohlídal I. Ultramicroscopy 94 (2003) 19
14. M. Valtr, I. Ohlídal, P. Klapetek, AFM study of hydrocarbon thin films, in: WDS'05 Proceedings of Contributed Papers, Part II, 2005, pp. 391-396.
15. Chen Y., and Huang W. Meas. Sci. Technol. 15 (2004) 2005
16. Liu Z.J., Jiang N., Shen Y.G., and Mai Y.W. J. Appl. Phys. 92 (2002) 3559
17. Zhang C.H., Liu Z.J., Li K.Y., Shen Y.G., and Luo J.B. J. Appl. Phys. 95 (2004) 1460
18. Mannelquist A., Almquist N., and Fredriksson S. Appl. Phys. A 66 (1998) S891
19. Zhao Y.P., Yang H.N., Wang G.C., and Lu T.M. Appl. Phys. Lett. 68 (1996) 3063
20. Yang H.N., Chan A., and Wang G.C. J. Appl. Phys. 74 (1993) 101
21. Palasantzas G., and Krim J. Phys. Rev. B 48 (1993) 2873
22. Raible M., Linz S.J., and Hänggi P. Phys. Rev. E 62 (2000) 1691
23. Choi1 J., Park Y.B., and Scherer A. Nanotechnology 16 (2005) 1655
24. Zhao Y.P., Wu I., Cheng C.F., Block U., Wang G.C., and Lu T.M. J. Appl. Phys. 84 (1998) 2571
25. Hojo D., Oeda H., Tokuda N., and Yamabe K. Jpn. J. Appl. Phys. 42 (2003) 1903
26. Sahoo N.K., Thakur S., Tokas R.B., and Kamble N.M. Appl. Surf. Sci. 253 (2007) 6787
27. Curtis C.E., and Sowman H.G. J. Am. Ceram. Soc. 36 (1953) 190