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Volumn 103, Issue 9, 2008, Pages
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Effect of silicon interstitials on Cu precipitation in n -type Czochralski silicon
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Author keywords
[No Author keywords available]
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Indexed keywords
DISLOCATIONS (CRYSTALS);
HEAT TREATMENT;
OPTICAL MICROSCOPY;
OXIDATION;
PRECIPITATION (CHEMICAL);
SILICON;
STRESS ANALYSIS;
TRANSMISSION ELECTRON MICROSCOPY;
INDUCED STRESS;
PRECIPITATE COLONIES;
SILICON INTERSTITIALS;
THERMAL OXIDATION;
CRYSTAL GROWTH FROM MELT;
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EID: 43949124178
PISSN: 00218979
EISSN: None
Source Type: Journal
DOI: 10.1063/1.2908215 Document Type: Article |
Times cited : (11)
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References (25)
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