Atomic hydrogen induced gallium nanocluster formation on the Si(1 0 0) surface

Surface Science

Volumn 602, Issue 10, 2008, Pages 1898-1902

  Mach, Jindřich ^a   Čechal, Jan ^a   Kolíbal, Miroslav ^a   Potoček, Michal ^a   Šikola, Tomáš ^a  

^a BRNO UNIVERSITY OF TECHNOLOGY   (Czech Republic)

Author keywords

Ga; Gallium; Hydrogen; Low energy electron diffraction (LEED); Nanoclusters; Photoemission; Si(1 0 0); Silicon; Surface structure; Synchrotron radiation photoelectron spectroscopy (SR PES)

Indexed keywords

GALLIUM COMPOUNDS; LOW ENERGY ELECTRON DIFFRACTION; PHOTOELECTRON SPECTROSCOPY; PHOTOEMISSION; SURFACE STRUCTURE; SYNCHROTRON RADIATION;

ATOMIC HYDROGEN; GALLIUM NANOCLUSTERS; SYNCHROTRON RADIATION PHOTOELECTRON SPECTROSCOPY (SR-PES);

NANOCLUSTERS;

EID: 43849108608     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2008.03.038     Document Type: Article

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