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Applied Surface Science

Volumn 254, Issue 17, 2008, Pages 5564-5568

Comparison and semiconductor properties of nitrogen doped carbon thin films grown by different techniques

(7) Alibart, F a Drouhin, O Durand a Benlahsen, M a Muhl, S b Rodil, S Elizabeth b Camps, E c Escobar Alarcon, L c

a Universite de Picardie Jules Verne (France)

b UNIVERSIDAD NACIONAL AUTÓNOMA DE MÉXICO (Mexico)

c Instituo National de Investigationes Nucleares (Mexico)

Author keywords

Carbon nitride; DC sputtering; Pulsed laser deposition; Radio frequency magnetron sputtering

Indexed keywords

CARBON NITRIDE; ELECTRIC CONDUCTIVITY; GAS MIXTURES; MAGNETRON SPUTTERING; RAMAN SPECTROSCOPY; SEMICONDUCTOR MATERIALS;

FILM COMPOSITION; RADIO FREQUENCY MAGNETRON SPUTTERING;

THIN FILMS;

EID: 43849102710 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/j.apsusc.2008.02.108 Document Type: Article

Times cited : (19)

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