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Journal of Applied Physics

Volumn 88, Issue 9, 2000, Pages 4961-4966

Modeling of incident particle energy distribution in plasma immersion ion implantation

(3) Tian, X B a Kwok, D T K a Chu, Paul K a

a CITY UNIVERSITY OF HONG KONG (Hong Kong)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0009818586 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.1319163 Document Type: Article

Times cited : (25)

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