Measurement of a CD and sidewall angle artifact with two-dimensional CD AFM metrology

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2725, Issue , 1996, Pages 572-588

  Dixson, Ronald ^a   Sullivan, Neal T ^a   Schneir, Jason ^a   McWaid, Thomas H ^a   Tsai, Vincent W ^a   Prochazka, Jaroslav J ^a   Young, Michael ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRITICAL DIMENSIONS; METROLOGY;

MICROSCOPIC EXAMINATION; PHOTOLITHOGRAPHY; RELIABILITY; SEMICONDUCTOR DEVICE MANUFACTURE; STANDARDS;

DISTANCE MEASUREMENT;

EID: 0029766721     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (27)