Photoconductivity characterization of silicon wafer mirror-polishing subsurface damage related to gate oxide integrity

Journal of Crystal Growth

Volumn 210, Issue 1, 2000, Pages 36-39

  Ogita, Y ^a   Kobayashi, K ^a   Daio, H ^b  

^a KANAGAWA INSTITUTE OF TECHNOLOGY   (Japan)

^b High Performance Materials Department   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CLEANING; CRYSTAL DEFECTS; ELECTRIC BREAKDOWN OF SOLIDS; EPITAXIAL GROWTH; GATES (TRANSISTOR); OXIDES; PHOTOCONDUCTIVITY; POLISHING; SEMICONDUCTOR GROWTH; SURFACE ROUGHNESS;

GATE OXIDE BREAKDOWN; GATE OXIDE INTEGRITY (GOI);

SILICON WAFERS;

EID: 0033873511     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(99)00642-9     Document Type: Article

References (9)

1. 2 Interface-3. Vol. 96-1:1996;379 The Electrochemical Society, Inc. Pennington, NJ.
2. Ogita Y., Hosoda Y., Miyazaki M. Higashi G.S., Hirose M., Raghavan S., Verhaverbeke S. Science and Technology of Semiconductor Surface Preparation. Vol. 477:1997;209 Materials Research Society, Warrendale, PA.
3. Ogita Y., Shinohara H., Sawanobori T., Kurokawa M. In-Line Characterization Technique for Performance and Yield Enhancement in Microelectronic Manufacturing II. Vol. 3509:1998;65 The International Society for Optical Engineering, WA.
4. Nakano M., Masumura H., Kudo H. Extended Abstracts of the 54th Spring Meeting. Vol. 2:1993;793 The Japan Society of Applied Physics, Tokyo.
5. Ogita Y. Semicond. Sci. Tech. 7:1992;A175.
6. Ogita Y., Nakano M., Masumura H. Ashok S., Chevsllier J., Akasaki I., Johnson M.M., Sopori B.L. Defect and Impurity Engineered Semiconductors and Devices. Vol. 378:1995;591 Materials Research Society, Warrendale, PA.
7. Takeda K., Ishida E., Hiraiwa A. Extended Abstracts of the 43th Spring Meeting. Vol. 1:1996;346 The Japan Society of Applied Physics, Tokyo.
8. For example; T. Ohmi, M. Miyashita, M. Itano, T. Imaoka, I. Kawanabe, IEEE Trans. Electron Devices 39 (1992) 537.
9. Miyashita M., Fukui H., Kubota A., Samata S., Hiratsuka H., Matsushita Y. Extended abstracts of the 1991 International Conference on Solid State Devices and Materials. 1991;5686 The Japan Society of Applied Physics and Related Societies, Tokyo, Japan.