Experiments and observations regarding the mechanisms of glass removal in magnetorheological finishing

Applied Optics

Volumn 40, Issue 1, 2001, Pages 20-33

  Shorey, Aric B ^a,c   Jacobs, Stephen D ^b,d   Kordonski, William I ^e   Gans, Roger F ^b  

^a UNIVERSITY OF ROCHESTER   (United States)

^b University of Rochester   (United States)

^c JDS UNIPHASE   (United States)

^d UNIVERSITY OF ROCHESTER   (United States)

^e QED TECHNOLOGIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABRASIVES; FINISHING; HARDNESS; MAGNETIC FIELDS; RHEOLOGY; YIELD STRESS;

GLASS REMOVAL;

GLASS;

EID: 0002259968     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.40.000020     Document Type: Article

References (45)

1. M. J. Cumbo, “Chemo-mechanical interactions in optical polishing,” Ph.D. dissertation (University of Rochester, Rochester, N.Y., 1993), Chap. 1.
2. M. Buijs and K. Korpel-Van Houten, “A model for lapping of glass,” J. Mater. Sci. 28, 3014-3020 (1993).
3. J. C. Lambropoulos, S. D. Jacobs, and J. Ruckman, “Material removal from grinding to polishing,” Ceram. Trans. 102, 113-128 (1999).
4. T. S. Izumitani, Optical Glass, American Institute of Physics Translation Series (American Institute of Physics, New York, 1986), pp. 92-98.
5. A. Kaller, “On the polishing of glass, particularly the precision polishing of optical surfaces,” Glastech. Ber. 64, 241-252 (1991).
6. F. W. Preston, “The theory and design of plate glass polishing machines,” J. Soc. Glass Technol. 11, 214-256 (1927).
7. W. L. Silvernail and N. J. Goetzinger, “The mechanics of glass polishing: part one,” The Glass Industry (April, 1971), pp. 130-133, 152.
8. W. L. Silvernail and N. J. Goetzinger, “The mechanism of glass polishing: conclusion,” The Glass Industry (May, 1971), pp. 172-175.
9. T. A. Michalske and B.C. Bunker, “A chemical kinetics model for glass fracture,” J. Am. Ceram. Soc. 76, 2613-2618 (1993).
10. L. M. Cook, “Chemical processes in glass polishing,” J. Non-Cryst. Solids 20, 152-171 (1990).
11. M. J. Cumbo, D. Fairhurst, S. D. Jacobs, and B. E. Puchebner, “Slurry particle size evolution during the polishing of optical glass,” Appl. Opt. 34, 3743-3755 (1995).
12. H. Yokota, H. Sakata, M. Nishibori, and K. Kinosita, “Ellipso-metric study of polished glass surfaces,” Surf. Sci. 16, 265-274 (1969).
13. M. Maaza, B. Farnoux, F. Samuel, C. Sella, and T. Trocellier, “Effect of mechanical polishing on the surface structure of glasses studied by grazing angle neutron reflectometry,” Opt. Commun. 100, 220-230 (1993).
14. A. B. Shorey, K. Xin, K. Chen, and J. C. Lambropoulos, “Deformation of fused silica: nanoindentation and densification,” in Inorganic Optical Materials, A. J. Marker, ed., Proc. SPIE 3424, 72-81 (1999).
15. A. Kaller, “Properties of polishing media for precision optics,” Glastech. Ber. 6, 174-183 (1998).
16. N. B. Kirk and J. V. Wood, “The effect of the calcination process on the crystallite shape of sol-gel cerium oxide used for glass polishing,” J. Mater. Sci. 30, 2171-2175 (1995).
17. D. Golini, S. Jacobs, W. Kordonski, and P. Dumas, “Precision optics fabrication using magnetorheological finishing,” in Advanced Materials for Optics and Precision Structures, M. Ealey, R. A. Paquin, and T. B. Parsonage, eds., Vol. CR67 of SPIE Critical Review Series (SPIE, Bellingham, Wash., 1997), pp. 251-274.
18. S. D. Jacobs, S. A. Arrasmith, I. A. Kozhinova, L. L. Gregg, A. B. Shorey, and H. J. Romanofsky, “An overview of magne-torheological finishing (MRF) for precision optics manufacturing,” Ceram. Trans. 102, 185-199 (1999).
19. S. R. Arrasmith, I. A. Kozhinova, L. L. Gregg, A. B. Shorey, H. J. Romanofsky, S. D. Jacobs, D. Golini, W. I. Kordonski, S. Hogan, and P. Dumas, “Details of the polishing spot in mag-netorheological finishing (MRF),” in Optical Manufacturing and TestingIII, P. Stahl, ed., Proc. SPIE 3782, 92-100 (1999).
20. S. D. Jacobs, W. Kordonski, I. V. Prokhorov, D. Golini, G. R. Gorodkin, and T. D. Strafford, “Magnetorheological fluid composition,” U.S. patent 5,804,095 (8 September 1998).
21. We used Zygo Mark IVxp or Zygo GPI xpHR phase-shifting interferometer systems for all data acquisition and analysis related to polishing spots and a He-Ne laser source with k = 632.8 nm (Zygo Corp., Middlefield, Conn. 06455).
22. Zygo NewView white-light optical profiler, areal over 0.25 mm X 0.35 mm with a 20X Mirau objective, 1.1-p.m lateral resolution (Zygo Corp., Middlefield Conn. 06455).
23. W. Kordonski, D. Golini, P. Dumas, S. Hogan, and S. Jacobs, “Magnetorheological suspension-based finishing technology (MRF),” in Fifth Annual International Symposium on Smart Structures and Materials, J. M. Sater, ed., Proc. SPIE 3326, 527-535 (1998).
24. A. B. Shorey, “Mechanisms of material removal in magneto-rheological finishing (MRF) of glass,” Ph.D. dissertation (University of Rochester, Rochester, N.Y., 2000), Chap. 3.
25. A. B. Shorey, “Mechanisms of material removal in magneto-rheological finishing (MRF) of glass, Chap. 2.
26. A. B. Shorey, W. I. Kordonski, S. R. Gorodkin, S. D. Jacobs, R. F. Gans, K. M. Kwong, and C. H. Farny, “Design and testing of a new magnetorheometer,” Rev. Sci. Instrum. 70, 4200-4206 (1999).
27. Q22 (QED Technologies, 1040 University Ave., Rochester, N.Y. 14607).
28. Magnetic flux measurements were taken with the F. W. Bell Model 9500 Gaussmeter (Bell Technologies Inc., Ontario, Fla. 32807).
29. Computrac Max-1000 moisture analyzer (Arizona Instruments, Phoenix, Ariz.).
30. Brookfield DV-III cone and plate viscometer (Brookfield Engineering Laboratories, Inc., Stoughton, Mass. 02072).
31. Nanoprobe III atomic force microscope (Digital Instruments, Santa Barbara, Calif.).
32. We measured the pad with the I-scan pressure measurement system from Tekscan, Inc., Boston, Mass. We used a 0.1-mm-thick 5051 pressure film with a maximum allowable load of 345 kPa (50 psi) and a lateral resolution of 1.27 mm.
33. Linear ball slide (Parker Hannafin Corp., Cleveland, Ohio).
34. LKCP 475 5-lb load cell (Cooper Instruments, Warrenton, Va.).
35. A. B. Shorey, K. M. Kwong, K. M. Johnson, and S. D. Jacobs, “Nanoindentation hardness of particles used in magnetorheo-logical finishing (MRF),” Appl. Opt. 39, 5194-5204 (2000).
36. A. B. Shorey, L. L. Gregg, H. J. Romanofsky, S. R. Arrasmith, Kozhinova, J. Hubregsen, and S. D. Jacobs, “Study of material removal during magnetorheological finishing,” in Optical Manufacturing and Testing III, H. Stahl, ed., Proc. SPIE 3782, 101-111 (1999). Corning 7940 (Corning, Inc., Corning, N.Y.).
37. R. S. Higgins and S. A. Klinger, eds., High Purity Solvent Guide (Baxter Diagnostics, Inc., Burdick and Jackson Division, Muskegon, Mich. 49443, 1990).
38. Brookfield DV-II digital viscometer (Brookfield Engineering Laboratories, Inc., Stoughton, Mass. 02072).
39. Ref. 24, Chap. 5.
40. NanoTek cerium oxide (Nanophase Technologies Corp., Burr Ridge, Ill.).
41. NanoTek (Gamma) aluminum oxide (Nanophase Technologies Corp., Burr Ridge, Ill.).0.125-p.m Hyprez Type PC diamonds (Engis Corp., Wheeling, Ill.).
42. NanoTek cerium oxide and aluminum oxide product literature (Nanophase Technologies Corp., Burr Ridge, Ill., 2000), www. nanophase.com/HTML/PRODUCTS.
43. I. Kozhinova, Center for Optics Manufacturing, University of Rochester, 240 East River Road, Rochester, N.Y. 14623 (Personal communication, 1999).
44. “Fundamentals of particle sizing,” product literature (Nanophase Technologies Corp., Burr Ridge, Ill., 1994).
45. Engis diamond product literature (Engis Corp., Wheeling, Ill., 2000), www.engis.com/powders_powders.html.