Fabrication of hybrid superconductor-semiconductor nanostructures by integrated ultraviolet-atomic force microscope lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 15, Issue 4, 1997, Pages 1398-1401

  Pingue, Pasqualantonio ^a,b   Lazzarino, Marco ^a,b   Beltram, Fabio ^a,b   Cecconi, Ciro ^c,d   Baschieri, Paolo ^c   Frediani, Carlo ^c   Ascoli, Cesare ^c  

^a SCUOLA NORMALE SUPERIORE   (Italy)

^b LABORATORIO TASC   (Italy)

^c CNR Consiglio Nazionale delle Ricerche   (Italy)

^d UNIVERSITY OF OREGON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYOSTATS; CURRENT VOLTAGE CHARACTERISTICS; ELECTRIC CURRENT MEASUREMENT; ETCHING; NANOSTRUCTURED MATERIALS; PHOTORESISTS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING INDIUM COMPOUNDS; SEMICONDUCTOR DEVICE STRUCTURES; VOLTAGE MEASUREMENT;

CURRENT VOLTAGE MEASUREMENTS; INTEGRATED ULTRAVIOLET ATOMIC FORCE MICROSCOPE LITHOGRAPHY; WET CHEMICAL ETCHING;

NANOTECHNOLOGY;

EID: 0031192561     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589547     Document Type: Article

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