Comparison of curing processes for porous dielectrics measurements from specular X-ray reflectivity

Journal of the Electrochemical Society

Volumn 151, Issue 8, 2004, Pages

  Hedden, Ronald C ^a,c   Waldfried, Carlo ^b   Lee, Hae Jeong ^a   Escorcia, Orlando ^b  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b Axcelis Technologies Incorporated   (United States)

^c PENNSYLVANIA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER MODELING; NANOPOROUS FILMS; POLYMETHYLSILSEQUIOXANE; SPECULAR X-RAY REFLECTIVITY (SXR);

ALCOHOLS; CURING; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDROPHILICITY; HYDROPHOBICITY; HYDROXYLATION; PLASMA APPLICATIONS; POROUS MATERIALS; PRESSURE EFFECTS; REFLECTION; REFLECTOMETERS; THERMAL EFFECTS; ULTRAVIOLET RADIATION; X RAY ANALYSIS;

DIELECTRIC MATERIALS;

EID: 4344595774     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1766311     Document Type: Article

References (18)

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