HRBS/channeling studies of ultra-thin ITO films on Si

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 266, Issue 8, 2008, Pages 1464-1467

  Malar, P ^a   Chan, T K ^a   Ho, C S ^a   Osipowicz, T ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

High resolution RBS; Interfacial strain; Ion channeling

Indexed keywords

INDIUM COMPOUNDS; INTERFACES (MATERIALS); MAGNETRON SPUTTERING; RUTHERFORD BACKSCATTERING SPECTROSCOPY; STRAIN MEASUREMENT; SUBSTRATES;

HIGH RESOLUTION RBS; HIGH RESOLUTION RUTHERFORD BACKSCATTERING SPECTROSCOPY (HRBS); INTERFACIAL STRAIN; ION CHANNELING;

ULTRATHIN FILMS;

EID: 43049165335     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2007.11.022     Document Type: Article

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