Inhomogeneous decomposition of ultrathin oxide films on Si(100): Application of Avrami kinetics to thermal desorption spectra

Journal of Chemical Physics

Volumn 128, Issue 16, 2008, Pages

  Kinefuchi, Ikuya ^a   Yamaguchi, Hiroki ^b   Sakiyama, Yukinori ^c   Takagi, Shu ^a   Matsumoto, Yoichiro ^a  

^a UNIVERSITY OF TOKYO   (Japan)

^b NAGOYA UNIVERSITY   (Japan)

^c University of California   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BINDING SITES; PYROLYSIS; REACTION KINETICS; SILICON COMPOUNDS; THERMAL DESORPTION;

AVRAMI KINETICS; DESORPTION SPECTRUM;

ULTRATHIN FILMS;

EID: 42949099309     PISSN: 00219606     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2905209     Document Type: Article

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